Study of Co-Deposition of Tantalum and Titanium during the Formation of Layered Composite Materials by Magnetron Sputtering
Author:
Nasakina Elena OlegovnaORCID, Sudarchikova Maria Andreevna, Demin Konstantin YurievichORCID, Mikhailova Alexandra Borisovna, Sergienko Konstantin Vladimirovich, Konushkin Sergey ViktorovichORCID, Kaplan Mikhail AlexandrovichORCID, Baikin Alexander SergeevichORCID, Sevostyanov Mikhail Anatolyevich, Kolmakov Alexei GeorgievichORCID
Abstract
Composite materials "base–transition layer–surface metal layer (Ta/Ti)" were produced using a complex vacuum technology including magnetron sputtering. The structure (by scanning electron microscopy, Auger electron spectroscopy, X-ray diffractometry) and mechanical properties were studied. An almost linear increase in the thickness of both the surface and transition layers was observed with increasing deposition time and power; however, the growth of the surface layer slowed down with increasing power above some critical value. The transition zone with the growth of time stopped growing upon reaching about 300 nm and was formed approximately 2 times slower than the surface one (and about 3.5 times slower with power). It was noted that with equal sputtering–deposition parameters, the layer growth rates for tantalum and titanium were the same. In the sample with a Ta surface layer deposited on titanium, a strongly textured complex structure with alpha and beta Ta was observed, which is slightly related to the initial substrate structure and the underlying layer. However, even at small thicknesses of the surface layer, the co-deposition of tantalum and titanium contributes to the formation of a single tantalum phase, alpha.
Funder
Russian Science Foundation
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces
Reference75 articles.
1. Wiatrowski, A., Mazur, M., Obstarczyk, A., Wojcieszak, D., Kaczmarek, D., Morgiel, J., and Gibson, D. (2018). Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings, 8. 2. El-Fattah, H.A.A., El-Mahallawi, I.S., Shazly, M.H., and Khalifa, W.A. (2019). Optical Properties and Microstructure of TiNxOy and TiN Thin Films before and after Annealing at Different Conditions. Coatings, 9. 3. Hu, Y., Rasadujjaman, M., Wang, Y., Zhang, J., Yan, J., and Baklanov, M. (2021). Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates. Coatings, 11. 4. Dongquoc, V., Seo, D.-B., Anh, C.V., Lee, J.-H., Park, J.-H., and Kim, E.-T. (2022). Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures. Appl. Sci., 12. 5. Korotkova, K., Bainov, D., Smirnov, S., Yunusov, I., and Zhidik, Y. (2020). Electrical Conductivity and Optical Properties of Nanoscale Titanium Films on Sapphire for Localized Plasmon Resonance-Based Sensors. Coatings, 10.
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
|
|