Photocured Zwitterionic Coatings Containing POSS for Antifogging Applications

Abstract

The conventional fabrication of antifogging polymer coatings such as zwitterionic or amphiphilic copolymers typically require multiple processes. In this work, a simple photocuring method was used to create a series of zwitterionic coatings containing polyhedral oligomeric silsesquioxane (POSS) without the need to prepare copolymer. Surface analysis demonstrated that the coating thickness was typically about 6 μm, and the surface POSS content showed a tendency of increasing with POSS. A wettability analysis demonstrated that zwitterionic coating with high POSS content held better water absorbing capability than that with low POSS content and without POSS. Furthermore, it was found that a high proportion of POSS contributed towards the enhancement of transmittance. The excellent antifogging properties of coatings with a high mass fraction of POSS can be ascribed to the aforementioned good wettability and transmittance. It is expected that zwitterionic coating via the simple incorporation of POSS can be utilized for practical application.