Electronic Properties of Group-III Nitride Semiconductors and Device Structures Probed by THz Optical Hall Effect

Author:

Armakavicius Nerijus12ORCID,Kühne Philipp12ORCID,Papamichail Alexis12ORCID,Zhang Hengfang12ORCID,Knight Sean12ORCID,Persson Axel12ORCID,Stanishev Vallery12ORCID,Chen Jr-Tai13ORCID,Paskov Plamen12ORCID,Schubert Mathias14ORCID,Darakchieva Vanya125ORCID

Affiliation:

1. Center for III-Nitride Technology (C3NiT-Janzén), Linköping University, 581 83 Linköping, Sweden

2. Department of Physics, Chemistry and Biology (IFM), Linköping University, 581 83 Linköping, Sweden

3. SweGaN AB, 582 78 Linköping, Sweden

4. Department of Electrical and Computer Engineering, University of Nebraska-Lincoln, Lincoln, NB 68588, USA

5. NanoLund, Center for III-Nitride Technology (C3NiT-Janzén), Terahertz Materials Analysis Center, THeMAC and Solid State Physics Division, Lund University, 221 00 Lund, Sweden

Abstract

Group-III nitrides have transformed solid-state lighting and are strategically positioned to revolutionize high-power and high-frequency electronics. To drive this development forward, a deep understanding of fundamental material properties, such as charge carrier behavior, is essential and can also unveil new and unforeseen applications. This underscores the necessity for novel characterization tools to study group-III nitride materials and devices. The optical Hall effect (OHE) emerges as a contactless method for exploring the transport and electronic properties of semiconductor materials, simultaneously offering insights into their dielectric function. This non-destructive technique employs spectroscopic ellipsometry at long wavelengths in the presence of a magnetic field and provides quantitative information on the charge carrier density, sign, mobility, and effective mass of individual layers in multilayer structures and bulk materials. In this paper, we explore the use of terahertz (THz) OHE to study the charge carrier properties in group-III nitride heterostructures and bulk material. Examples include graded AlGaN channel high-electron-mobility transistor (HEMT) structures for high-linearity devices, highlighting the different grading profiles and their impact on the two-dimensional electron gas (2DEG) properties. Next, we demonstrate the sensitivity of the THz OHE to distinguish the 2DEG anisotropic mobility parameters in N-polar GaN/AlGaN HEMTs and show that this anisotropy is induced by the step-like surface morphology. Finally, we present the temperature-dependent results on the charge carrier properties of 2DEG and bulk electrons in GaN with a focus on the effective mass parameter and review the effective mass parameters reported in the literature. These studies showcase the capabilities of the THz OHE for advancing the understanding and development of group-III materials and devices.

Funder

Swedish Governmental Agency for Innovation Systems

Swedish Research Council VR

Swedish Foundation for Strategic Research

Swedish Government Strategic Research Area NanoLund

National Science Foundation

Air Force Office of Scientific Research

University of Nebraska Foundation

J. A. Woollam Foundation

Publisher

MDPI AG

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