Abstract
Polarization imaging has been proven as an important technique for obtaining multi-dimensional information in complex environments. As the prevalent polarizers, metal gratings are widely used especially for focal-plane detection due to their flexibility and easy integration. However, high-performance polarization gratings with high transmittance and large extinction ratios typically need a large aspect ratio in design, resulting in more difficulties in fabrication with limited practical performances. In this study, we designed and fabricated a high-performance polarizer using metallic–dielectric gratings (MDGs). Through a single CMOS-compatible procedure that included electron-beam lithography (EBL) and a collimated thermal evaporation deposition process, we achieved a high TM transmittance (~90%) and a high extinction ratio (~100:1) in the experiment. We believe that our work provides an effective approach to high-performance polarization gratings, which could contribute to the development of on-chip integrated polarization imaging.
Funder
National Natural Science Foundation of China
Science and Technology Commission of Shanghai Municipality
The “Shu Guang” Project Supported by Shanghai Municipal Education Commission and Shanghai Education
Shanghai Municipal Education Commission
Russian Foundation for Basic Research
China Postdoctoral Science Foundation
Subject
Radiology, Nuclear Medicine and imaging,Instrumentation,Atomic and Molecular Physics, and Optics
Cited by
1 articles.
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