Abstract
Silicon (Si)-based geometric phase metasurfaces are fantastic state-of-the-art light field manipulators. While the optical metasurfaces generally excel in the micro-control of light with supreme accuracy and flexibility, the geometric phase principle grants them the much-desired broadband phase manipulation property, free from material dispersion. Furthermore, adopting Si as their fundamental material serves as a critical step toward applicable practice. Thanks to the optical lossless feature and CMOS compatibility, Si-based metasurfaces are bestowed with high efficiency and fabrication conveniency. As a result, the Si-based metasurfaces can be perfectly integrated into Si-based optoelectronic chips with on-demand functions, trending to replace the conventional bulky and insufficient macroscopic optical devices. Here we review the origin, physical characteristics, and recent development of Si-based geometric-phase metasurfaces, especially underscoring their important achievements in broadband, high efficiency, and multitasking functionalities. Lastly, we envision their typical potential applications that can be realized in the near future.
Funder
National Natural Science Foundation of China
The Key R&D Program of Guangdong Province
Subject
Radiology, Nuclear Medicine and imaging,Instrumentation,Atomic and Molecular Physics, and Optics
Cited by
2 articles.
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