Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition

Abstract

In this work, the potential of a microwave (MW)-induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non-uniform monomer distribution near the substrate and the dependency of the deposition area on the monomer-containing gas flow rate. A non-homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.