Discussion of Possible Surface Processes during the Reactive SiOx Film Deposition in a Planar Magnetron Sputtering Equipment-Reference-Cited by-同舟云学术

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Discussion of Possible Surface Processes during the Reactive SiOx Film Deposition in a Planar Magnetron Sputtering Equipment

Published:1984-08-16 Issue:2 Volume:84 Page:379-386
ISSN:0031-8965
Container-title:Physica Status Solidi (a)
language:en
Short-container-title:Phys. Stat. Sol. (a)

Author:

Brodkorb W.,Salm J.,Steinbeiss E.

Publisher

Wiley

Reference8 articles.

1. On problems of reaction kinetics during deposition of silicon oxide films by reactive sputtering of silicon in a magnetron sputtering system

2. Wechselwirkung von Überschall‐Molekularstrahlen mit Einkristall‐Oberflächen

3. Oxygen adsorption on a Ge(100) surface

4. Chemisorption, Butterworths, London/Washington 1955.

5. The Theory of Adsorption and Catalysis, Academic Press, (Inc.), London/New York 1970.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thin Film Deposition Techniques (PVD);Lecture Notes in Physics

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