Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer-based positive-tone photoresist materials-Reference-Cited by-同舟云学术

Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer-based positive-tone photoresist materials

Published:2014-08-22 Issue:2 Volume:53 Page:193-199
ISSN:0887-624X
Container-title:Journal of Polymer Science Part A: Polymer Chemistry
language:en
Short-container-title:J. Polym. Sci. Part A: Polym. Chem.

Author:

Sun Guorong¹²³,Cho Sangho¹²³,Yang Fan¹,He Xun¹²³,Pavía-Sanders Adriana¹²³,Clark Corrie¹²,Raymond Jeffery E.¹²³⁴,Verkhoturov Stanislav V.¹,Schweikert Emile A.¹,Thackeray James W.⁵,Trefonas Peter⁵,Wooley Karen L.¹²³⁴

Affiliation:

1. Department of Chemistry; Texas A&M University; College Station Texas 77842

2. Department of Chemical Engineering; Texas A&M University; College Station Texas 77842

3. Department of Materials Science and Engineering; Texas A&M University; College Station Texas 77842

4. Laboratory for Synthetic-Biologic Interactions; Texas A&M University; College Station Texas 77842

5. Dow Electronic Materials; Marlborough Massachusetts 01752

Funder

Dow Chemical Company

National Science Foundation

Welch Foundation

Publisher

Wiley

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference37 articles.

1. Resist materials

2. Chemical Amplification Resists for Microlithography

3. Cationic chemistry and chemically amplified resist materials for microlithography: synthesis and applications of copolymers of 4-(1-hydroxy-1-methylethyl)styrene and styrene or 4-hydroxystyrene

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