Affiliation:
1. Key Laboratory for Advanced Materials Feringa Nobel Prize Scientist Joint Research Center Frontiers Science Center for Materiobiology and Dynamic Chemistry Joint International Research Laboratory for Precision Chemistry and Molecular Engineering Institute of Fine Chemicals School of Chemistry and Molecular Engineering East China University of Science & Technology 130 Meilong Road Shanghai 200237 P. R. China
2. Dow Chemical 936 Zhangheng Road Shanghai 201203 P. R. China
Abstract
AbstractDeveloping radical‐induced afterglow emission under ambient conditions is challenging since newly formed radical species are susceptible to air and water. In this work, long afterglow materials (up to 4 s) are realized by doping a series of N,N’‐diaryl‐5,10‐dihydrophenazine (DPP)derivatives into rigid cycloaliphatic epoxy resins (CER). The afterglow is found to result from the interaction between the matrix and the excited states of the dopants through the generation of radical species under continuous UV excitation, which can be regulated by the peripheral functional groups of the N‐phenyl substituents. Density functional theory (DFT) calculations predict that the introduction of electron‐withdrawing groups hinders the afterglow emission, which may be related to the reducing reduction potential and inefficient spin‐orbit coupling (SOC) coefficients. The afterglow emission of the radical‐based systems demonstrates a bright opportunity for information encryption, anti‐counterfeiting, and photolithography.
Funder
National Key Research and Development Program of China
National Natural Science Foundation of China
Program of Shanghai Academic Research Leader
Fundamental Research Funds for the Central Universities
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
7 articles.
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