Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf 0.5 Zr 0.5 O 2 Thin Films-Reference-Cited by-同舟云学术

Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf 0.5 Zr 0.5 O 2 Thin Films

Published:2021-03-23 Issue:10 Volume:8 Page:2100018
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv Materials Inter

Author:

Fields Shelby S.¹^ORCID,Smith Sean W.²,Fancher Chris M.³^ORCID,Henry Michael David²^ORCID,Wolfley Steve L.²,Sales Maria G.¹,Jaszewski Samantha T.¹^ORCID,Rodriguez Mark A.²^ORCID,Esteves Giovanni²^ORCID,Davids Paul S.²^ORCID,McDonnell Stephen J.¹^ORCID,Ihlefeld Jon F.⁴^ORCID

Affiliation:

1. Department of Materials Science and Engineering University of Virginia Charlottesville VA 22904 USA

2. Sandia National Laboratories Albuquerque NM 87185 USA

3. Materials Science and Technology Division Oak Ridge National Laboratory Oak Ridge TN 37830 USA

4. Department of Materials Science and Engineering Department of Electrical and Computer Engineering University of Virginia Charlottesville VA 22904 USA

Funder

Oak Ridge National Laboratory

U.S. Department of Energy

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202100018

Reference70 articles.

1. Ferroelectricity in hafnium oxide thin films

2. Factors Favoring Ferroelectricity in Hafnia: A First-Principles Computational Study