Effects of hydrogen pressure on hydrogenated amorphous silicon thin films prepared by low-temperature reactive pulsed laser deposition-Reference-Cited by-同舟云学术

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Effects of hydrogen pressure on hydrogenated amorphous silicon thin films prepared by low-temperature reactive pulsed laser deposition

Published:2016-09-13 Issue: Volume: Page:
ISSN:1862-6351
Container-title:physica status solidi (c)
language:en
Short-container-title:Phys. Status Solidi C

Author:

Mellos A.,Kandyla M.,Palles D.,Kompitsas M.

Funder

General Secretariat for Research and Technology, Greece, under the MS/AC S&T ERA.Net RUS program, STProject-212, FilmSolar

Publisher

Wiley

Subject

Condensed Matter Physics

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improved interface microstructure between crystalline silicon and nanocrystalline silicon oxide window layer of silicon heterojunction solar cells;Solar Energy Materials and Solar Cells;2024-01

2. Hot-wire CVD hydrogenated amorphous silicon for multi-layer photonic applications;Silicon Photonics XV;2020-02-26

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