Visible‐Light‐Driven Gas‐Phase Hydrogen Sulfide Decomposition using Organic‐Inorganic Hybrid Photocatalysts

Author:

Katayama Tomofumi1,Nagata Morio2ORCID

Affiliation:

1. Department of Industrial Chemistry Graduate School of Engineering. Tokyo University of Science 6-3-1 Niijuku, Katsushika-ku Tokyo 125-8585 Japan

2. Department of Industrial Chemistry, Graduate School of Engineering. Tokyo University of Science 6-3-1 Niijuku, Katsushika-ku Tokyo 125-8585 Japan

Abstract

AbstractHydrogen sulfide (H2S) is a toxic gas generated by chemical and geothermal power plants and has an unpleasant odor. Even low concentrations of H2S can cause odor problems upon release into the atmosphere; therefore, the efficient removal of H2S is required. Photocatalytic H2S decomposition methods have been extensively investigated because they are energy‐efficient; however, most methods involve the degradation of a sacrificial reagent after alkaline adsorption and gas‐phase decomposition at relatively high concentrations of 100 ppm or more. Although H2S decomposition by TiO2 under low‐concentration conditions has been reported, H2S is decomposed by ultraviolet (UV) light irradiation because TiO2 is unresponsive to visible light. In this study, a composite catalyst is synthesized to achieve the gas‐phase decomposition of low‐concentration hydrogen sulfide under visible light. By combining carbon nitride (g‐C3N4) with a cadmium sulfide (CdS) photocatalyst, a g‐C3N4/CdS catalyst is obtained, which reduces 10 ppm H2S to less than 1 ppm. This effective and simple photocatalyst is suitable for mitigating the odor issue related to H2S.

Publisher

Wiley

Subject

General Chemistry

Reference26 articles.

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3