A Process-Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI)-Reference-Cited by-同舟云学术

A Process-Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI)

Published:2015-11-10 Issue:10-11-12 Volume:21 Page:343-351
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Baggetto Loïc¹,Charvillat Cédric¹,Esvan Jérôme¹,Thébault Yannick¹,Samélor Diane¹,Vergnes Hugues²,Caussat Brigitte²,Gleizes Alain¹,Vahlas Constantin¹

Affiliation:

1. Centre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT); UMR5085 CNRS; 4 allée Emile Monso, BP-44362 31030 Toulouse Cedex 4 France

2. Laboratoire de Génie Chimique (LGC); Université de Toulouse; 4 allée Emile Monso, CS-84234 31432 Toulouse Cedex 4 France

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201507190/fullpdf

Reference38 articles.

1. CVD of Al2O3 Thin Films Using Aluminum Tri-isopropoxide

2. Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

3. Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition

4. Corrosion protection of 304L stainless steel by chemical vapor deposited alumina coatings

5. Al2O3 coatings on stainless steel using pulsed-pressure MOCVD

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