Review of polymer materials with low dielectric constant
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Materials Chemistry,Organic Chemistry
Reference63 articles.
1. Analysis of Cu/Low-k structure under back end of line process
2. Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process
3. Characterization of low-k SiOCH dielectric for 45nm technology and link between the dominant leakage path and the breakdown localization
4. Evaluation of a PECVD advanced barrier (k=3.7) for 32nm CMOS technology and below
5. A method of fabricating metal-insulator-metal (MIM) capacitor in Cu/low-k backend interconnection process for RF application
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