Strain‐Engineering of Contact Energy Barriers and Photoresponse Behaviors in Monolayer MoS 2 Flexible Devices-Reference-Cited by-同舟云学术

Strain‐Engineering of Contact Energy Barriers and Photoresponse Behaviors in Monolayer MoS 2 Flexible Devices

Author:

Pak Sangyeon¹,Lee Juwon²,Jang A‐Rang³,Kim Seungje¹,Park Kyung‐Ho⁴,Sohn Jung Inn⁵,Cha SeungNam¹^ORCID

Affiliation:

1. Department of Physics Sungkyunkwan University (SKKU) Suwon Gyeonggi‐do 16419 Republic of Korea

2. Department of Engineering Science University of Oxford Parks Road Oxford OX1 3PJ UK

3. Advanced Materials Division Korea Research Institute of Chemical Technology (KRICT) Gajeong‐ro 141 Daejeon 34114 Republic of Korea

4. Convergence Technology Division Korea Advanced Nano Fab Center Suwon Gyeonggi‐do 16229 Republic of Korea

5. Division of Physics and Semiconductor Science Dongguk University‐Seoul Seoul 04620 Republic of Korea

Funder

National Research Foundation of Korea

National Science Foundation, United Arab Emirates

Ministry of Education

Ministry of Science, ICT and Future Planning

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

Reference41 articles.

Cited by 66 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献