Unmasking the Resolution–Throughput Tradespace of Focused‐Ion‐Beam Machining-Reference-Cited by-同舟云学术

Unmasking the Resolution–Throughput Tradespace of Focused‐Ion‐Beam Machining

Published:2022-08-21 Issue:38 Volume:32 Page:2111840
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv Funct Materials

Author:

Madison Andrew C.¹^ORCID,Villarrubia John S.¹,Liao Kuo‐Tang¹²,Copeland Craig R.¹^ORCID,Schumacher Joshua³,Siebein Kerry³,Ilic B. Robert¹³^ORCID,Liddle J. Alexander¹,Stavis Samuel M.¹^ORCID

Affiliation:

1. Microsystems and Nanotechnology Division National Institute of Standards and Technology Gaithersburg MD 20899 USA

2. Maryland Nanocenter College Park MD 20740 USA

3. CNST NanoFab National Institute of Standards and Technology Gaithersburg MD 20899 USA

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adfm.202111840

Reference79 articles.

1. High-resolution direct-write patterning using focused ion beams

2. A fast and sensitive room-temperature graphene nanomechanical bolometer

3. High-contrast and fast electrochromic switching enabled by plasmonics

4. A fully electric field driven scalable magnetoelectric switching element

5. Top-down, in-plane GaAs nanowire MOSFETs on an Al2O3buffer with a trigate oxide from focused ion-beam milling and chemical oxidation

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