Plasma Chemical Study of a RF Discharge Containing Aluminum Tri-Isopropoxide Using MIR Absorption Spectroscopy Based on External-Cavity Quantum Cascade Lasers-Reference-Cited by-同舟云学术

Plasma Chemical Study of a RF Discharge Containing Aluminum Tri-Isopropoxide Using MIR Absorption Spectroscopy Based on External-Cavity Quantum Cascade Lasers

Published:2012-09-17 Issue:10 Volume:52 Page:864-871
ISSN:0863-1042
Container-title:Contributions to Plasma Physics
language:en
Short-container-title:Contrib. Plasma Phys.

Author:

Lopatik D.,Niemietz S.,Fröhlich M.,Röpcke J.,Kersten H.

Publisher

Wiley

Subject

Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ctpp.201200044/fullpdf

Reference41 articles.

1. Nanocrystalline silicon films prepared from silane plasma in RF-PECVD, using helium dilution without hydrogen: structural and optical characterization

2. Diagnostics of SiOx-Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge

3. Characterization of an atmospheric pressure plasma jet for surface modification and thin film deposition

4. Complex (dusty) plasmas: Examples for applications and observation of magnetron-induced phenomena

5. The mass spectra of aluminum isopropoxide

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