Reactive Oxidation Induced Stoichiometric Modulation of Multivalent Vanadium Oxides

Author:

Song Sehwan12,Lee Dooyong13,Son Yeongjun1,Choi Yesul1,Kim Jiwoong14,Han Seonghoon1,Lee Jisung15,Kim Seokjun6,Jeong Seung Gyo7,Lim Si‐Heon8,Yan Jiafeng9,Kim Songkil6,Choi Woo Seok7,Kim Hyun Ho8,Kim Jaeyong9,Bae Jong‐Seong10,Takesue Naoshia11,Hwang Chanyong2,Park Sungkyun1ORCID

Affiliation:

1. Department of Physics Pusan National University Busan 46241 Korea

2. Quantum Spin Team Korea Research Institute of Standards & Science Daejeon 34113 Korea

3. Department of Physics Education Kyungpook National University Daegu 41566 Korea

4. Applied Materials Hwaseong 18469 Korea

5. Center for Scientific Instrumentation Korea Basic Science Institute Daejeon 34133 Korea

6. School of Mechanical Engineering Pusan National University Busan 46241 Korea

7. Department of Physics Sungkyunkwan University Suwon 16419 Korea

8. Department of Energy Engineering Convergence & School of Materials Science and Engineering Kumoh National Institute of Technology Gumi 39177 Korea

9. Department of Physics and Institute for High Pressure Hanyang University Seoul 04763 Korea

10. Busan Center Korea Basic Science Institute Busan 46742 Korea

11. Department of Applied Physics Fukuoka University Fukuoka 814‐0180 Japan

Abstract

Vanadium oxides, such as V2O3, VO2, and V2O5, have attracted considerable attention because of the fascinating physical properties of each oxidation state. On the other hand, precisely controlling the individual oxidation states is difficult due to the sensitivity of oxygen stoichiometry. This article reports that reactive oxygen annealing (ROA) can systematically change the oxidation state of the vanadium oxide films grown on a c‐Al2O3 substrate compared with typical annealing under O2 environments. Chemical, structural, electronic, and electrical analysis confirms the evolution of the vanadium oxide phases from V2O3 to V2O3/VO2, VO2, VO2/V2O5, and V2O5, showing that the ROA method can control and tune the oxidation state of the highly oxygen‐sensitive multivalent metal oxides.

Funder

Ministry of Education

Publisher

Wiley

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3