Water-Developable Poly(2-oxazoline)-Based Negative Photoresists-Reference-Cited by-同舟云学术

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Water-Developable Poly(2-oxazoline)-Based Negative Photoresists

Published:2012-01-19 Issue:5 Volume:33 Page:396-400
ISSN:1022-1336
Container-title:Macromolecular Rapid Communications
language:en
Short-container-title:Macromol. Rapid Commun.

Author:

Schenk Verena,Ellmaier Lisa,Rossegger Elisabeth,Edler Matthias,Griesser Thomas,Weidinger Gerald,Wiesbrock Frank

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Organic Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/marc.201100717/fullpdf

Reference23 articles.

1. Mobile Computing Has a Growing Impact on DSP Apps and Markets [Special Reports]

2. Organic Materials Challenges for 193 nm Imaging

3. Ag and Au/DNQ-novolac nanocomposites patternable by ultraviolet lithography: a fast route to plasmonic sensor microfabrication

4. Applications of Novel High-Aspect-Ratio Ultrathick UV Photoresist for Microelectroplating

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1. Poly(2‐Oxazoline)s;Macromolecular Engineering;2022-03-04

2. Temperature-Triggered/Switchable Thermal Conductivity of Epoxy Resins;Polymers;2020-12-26

3. Modulation of Thiol–Ene Coupling by the Molecular Environment of Polymer Backbones for Hydrogel Formation and Cell Encapsulation;ACS Applied Bio Materials;2020-08-25

4. Crosslinkable/functionalizable poly(2-oxazoline)based micelles;European Polymer Journal;2019-12

5. 3D‐Printing of High‐κ Thiol‐Ene Resins with Spiro‐Orthoesters as Anti‐Shrinkage Additive;Macromolecular Materials and Engineering;2019-10-14

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