Atmospheric Pressure Plasma Initiated Chemical Vapor Deposition Using Ultra-Short Square Pulse Dielectric Barrier Discharge-Reference-Cited by-同舟云学术

Atmospheric Pressure Plasma Initiated Chemical Vapor Deposition Using Ultra-Short Square Pulse Dielectric Barrier Discharge

Published:2014-08-22 Issue:1 Volume:12 Page:66-74
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Boscher Nicolas D.¹,Hilt Florian¹,Duday David¹,Frache Gilles¹,Fouquet Thierry²,Choquet Patrick¹

Affiliation:

1. Science and Analysis of Materials Department; Centre de Recherche Public-Gabriel Lippmann; 41. rue du Brill Belvaux L-4422 Luxembourg

2. Department of Advanced Materials and Structures; Centre de Recherche Public - Henri Tudor; 5. rue Bommel/ZAE Robert Steichen Hautcharage L-4940 Luxembourg

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference30 articles.

1. Emerging applications of stimuli-responsive polymer materials

2. 25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication

3. One-Dimensional Surface-Imprinted Polymeric Nanotubes for Specific Biorecognition by Initiated Chemical Vapor Deposition (iCVD)

4. Simple and Reliable Method to Incorporate the Janus Property onto Arbitrary Porous Substrates

5. Initiated PECVD of Organosilicon Coatings: A New Strategy to Enhance Monomer Structure Retention

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