Clean and Hydrogen‐Adsorbed AlInP(001) Surfaces: Structures and Electronic Properties

Author:

Glahn Luis Joel1,Ruiz Alvarado Isaac Azahel1ORCID,Neufeld Sergej1ORCID,Zare Pour Mohammad Amin2,Paszuk Agnieszka2ORCID,Ostheimer David2,Shekarabi Sahar2,Romanyuk Oleksandr3ORCID,Moritz Dominik Christian4,Hofmann Jan Philipp4ORCID,Jaegermann Wolfram4,Hannappel Thomas2,Schmidt Wolf Gero1ORCID

Affiliation:

1. Lehrstuhl für Theoretische Materialphysik Universität Paderborn 33095 Paderborn Germany

2. Institut für Physik Technische Universität Ilmenau Gustav-Kirchhoff-Strase 5 98693 Ilmenau Germany

3. Institute of Physics Academy of Sciences of the Czech Republic Cukrovarnicka 10 16200 Prague Czech Republic

4. Surface Science Laboratory Department of Materials and Earth Sciences Technische Universität Darmstadt Otto-Berndt-Strasse 3 64287 Darmstadt Germany

Abstract

Total energy and electronic structure calculations based on density functional theory are performed in order to determine the atomic structure and electronic properties of clean and hydrogen‐adsorbed Al0.5In0.5P(001) surfaces. It is found that most of the stable surfaces obey the electron‐counting rule and are characterized by surface atom dimerization. The dimer‐related surface states are predicted to occur in the vicinity of the bulk band edges. For a very narrow range of preparation conditions, ab initio thermodynamics predicts metal atomic wires formed by surface cations. A surface covered with a monolayer of buckled phosphorus dimers, where half of the phosphorus atoms are hydrogen saturated, is found to be stable for metal–organic vapor‐phase epitaxy growth conditions. The occurrence of this structure is confirmed by low‐energy electron diffraction and X‐ray photoelectron spectroscopy data measured on epitaxially grown Al0.52In0.48P(001) epilayers lattice matched to GaAs.

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

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