Low-Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High-Temperature Applications-Reference-Cited by-同舟云学术

Low-Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High-Temperature Applications

Published:2017-09-18 Issue:23 Volume:4 Page:1700912
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Furlan Kaline P.¹²^ORCID,Krekeler Tobias³,Ritter Martin³,Blick Robert²,Schneider Gerold A.¹,Nielsch Kornelius²⁴,Zierold Robert²,Janßen Rolf¹

Affiliation:

1. Institute of Advanced Ceramics; Hamburg University of Technology (TUHH); Denickestraße 15 21073 Hamburg Germany

2. Institute of Nanostructure and Solid State Physics and Center for Hybrid Nanostructures; Universität Hamburg; Jungiusstraße 11B 20355 Hamburg Germany

3. Electron Microscopy Unit (BeEM); Hamburg University of Technology (TUHH); Eißendorfer Straße 42 21073 Hamburg Germany

4. Leibniz Institute for Solid State and Materials Research Dresden; Institute for Metallic Materials; Helmholtzstraße 20 01069 Dresden Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference63 articles.

1. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

2. Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

3. Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel

4. Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition

5. Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors

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