Structural investigation of high-transmittance aluminum oxynitride films deposited by ion beam sputtering-Reference-Cited by-同舟云学术

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Structural investigation of high-transmittance aluminum oxynitride films deposited by ion beam sputtering

Published:2010-10-20 Issue:7 Volume:43 Page:1089-1094
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Wang Paul W.,Hsu Jin-Cherng,Lin Yung-Hsin,Chen Huang-Lu

Funder

Special Emphasize

National Science Council

Sapintia Culture and Education Foundation

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.3700/fullpdf

Reference17 articles.

1. Statistical evaluation of refractive index, growth rate, hardness and Young's modulus of aluminium oxynitride films

2. Reactive ion assisted deposition of aluminum oxynitride thin films

3. Ion‐beam‐sputtered AlOxNy encapsulating films

4. Optical properties of aluminum oxynitrides deposited by laser-assisted CVD

5. Optical properties of high transmittance aluminum oxynitride thin films for spectral range from near ultraviolet to visible

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