Role of Oxidative Stress in Telomere Length Regulation and Replicative Senescence
Author:
Publisher
Wiley
Subject
History and Philosophy of Science,General Biochemistry, Genetics and Molecular Biology,General Neuroscience
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1749-6632.2000.tb06639.x/fullpdf
Reference48 articles.
1. Differential roles for cyclin-dependent kinase inhibitors p21 and p16 in the mechanisms of senescence and differentiation in human fibroblasts;Stein;Mol. Cell. Biol.,1999
2. Telomeres shorten during ageing of human fibroblasts;Harley;Nature,1990
3. Principle of marginotomy in template synthesis of polynucle-otides;Olovnikov;Dokl. Akad. Nauk.,1971
4. Models of initiation of replicative senescence by loss of telomeric DNA;Allsopp;Exp Gerontol.,1995
5. Extension of life-span by introduction of telomerase into normal human cells;Bodnar;Science,1998
Cited by 355 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Aging Hallmarks and Progression and Age-Related Diseases: A Landscape View of Research Advancement;ACS Chemical Neuroscience;2023-12-14
2. Telomere length is not a useful tool for chronological age estimation in animals;BioEssays;2023-12-04
3. Associations between the New DNA-Methylation-Based Telomere Length Estimator, the Mediterranean Diet and Genetics in a Spanish Population at High Cardiovascular Risk;Antioxidants;2023-11-15
4. Does the Protective Effect of Zinc on Telomere Length Depend on the Presence of Hypertension or Type 2 Diabetes? Results from the Iwaki Health Promotion Project, Japan;Nutrients;2023-10-16
5. ROS-Mediated Fragmentation Alters the Effects of Hyaluronan on Corneal Epithelial Wound Healing;Biomolecules;2023-09-13
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3