IR Absorption Spectroscopy of Deposition Process of Amorphous Carbon Film due to Ethylene Plasma
Author:
Affiliation:
1. National Institute of Technology, Sasebo College
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/ieejfms/138/11/138_544/_pdf
Reference14 articles.
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3. (4) Ch. Deschenaux, A. Affolter, D. Magni, Ch. Hollenstein, and P. Fayet : “Investigations of CH4, C2H2 and C2H4 dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry”, J. Phys. D, Vol. 15, pp. 1876-1886 (1999)
4. (5) M. Meier and A. von Keudell : “Temperature dependence of the sticking coefficient of methyl radicals at hydrocarbon film”, J. Chem. Phys., Vol. 116, No. 12, pp. 5125-5136 (2002)
5. (6) A. von Keudell : “Formation of polymer-like hydrocarbon films from radical beams of methyl and atomic hydrogen”, Thin Solid Films, Vol. 402, No. 1-2, pp. 1-37 (2002)
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