1. Optimizing and enhancing optical systems to meet the low k1 challenge;Flagello,2003
2. New paradigm in lens metrology for lithographic scanner: evaluation and exploration;Lai,2004
3. Extending immersion lithography down to 1x nm production nodes;De Boeij,2013
4. Application of Ronchi interferometry to testing large aperture flat mirrors;Stoltzmann,1978