Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system
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Publisher
The Optical Society
Reference10 articles.
1. Extreme ultraviolet lithography
2. Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering
3. Interface imperfections in metal/Si multilayers
4. High-performance Mo/Si and W/BC multilayer mirrors for soft X-ray imaging optics
5. Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet
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1. Spectroscopic Techniques: Ultraviolet;Springer Handbook of Atomic, Molecular, and Optical Physics;2023
2. Robust design of broadband EUV multilayer using multi-objective evolutionary algorithm;Optics Communications;2018-03
3. Characterization of periodic extreme ultraviolet multilayer based on multi-objective evolutionary algorithm;Journal of Applied Physics;2017-11-14
4. Ultra-precision fabrication of 500 mm long and laterally graded Ru/C multilayer mirrors for X-ray light sources;Review of Scientific Instruments;2016-05
5. Influence of background pressure on the microstructure and optical properties of Mo/Si multilayers fabricated by magnetron sputtering;Science China Physics, Mechanics and Astronomy;2013-07-25
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