Etching characteristics of high-purity aluminum in hydrochloric acid solutions-Reference-Cited by-同舟云学术

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Etching characteristics of high-purity aluminum in hydrochloric acid solutions

Published:2007-03 Issue: Volume:449-451 Page:348-351
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Oh Han-Jun,Lee Jong-Ho,Ahn Hong-Joo,Jeong Yongsoo,Park No-Jin,Kim Seong-Su,Chi Choong-Soo

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference10 articles.

1. Initial stages of the anodic etching of aluminum foils studied by atomic force microscopy

2. Thickness‐Dependent Properties of Amorphous Anodic Alumina Films

3. Growth Rates of Aluminum Etch Tunnels

4. Effect of deformation temperature on the formation of ultrafine grains in the 5052 Al alloy

5. Surface Changes during A.C. Etching of Aluminum

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4. Effect on the corrosion resistance property of aluminum substrate by altering the wetting behavior;Journal of Coatings Technology and Research;2023-05-04

5. Effect of Cetyltrimethylammonium Bromide Additives on Etched Tunnel Formation of Aluminum Foils;Journal of The Electrochemical Society;2023-02-01

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