Controllable synthesis of core-shell SiO2@CeO2 abrasives for chemical mechanical polishing on SiO2 film
Author:
Publisher
Elsevier BV
Subject
Colloid and Surface Chemistry
Reference39 articles.
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2. Preface—JSS Focus Issue on CMP for Sub-10 nm technologies;Philipossian;ECS J. Solid State Sci. Technol.,2019
3. Shallow trench isolation chemical mechanical planarization: a review;Srinivasan;ECS J. Solid State Sci. Technol.,2015
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5. Mechanism of polishing of SiO2 films by CeO2 particles;Hoshino;J. Non-Cryst. Solids,2001
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