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Evaluating superelastic and shape memory effects using the photostress technique

  • Published:2020-09 Issue: Volume:24 Page:101156
  • ISSN:2352-4928
  • Container-title:Materials Today Communications
  • language:en
  • Short-container-title:Materials Today Communications

Author:

Adelfar Masoumeh,Tavangar Reza,Horandghadim Nazila,Khalil-Allafi Jafar

Funder

Sahand University of Technology

Publisher

Elsevier BV

Subject

Materials Chemistry,Mechanics of Materials,General Materials Science

Reference42 articles.

1. Introduction to Stress Analysis by the PhotoStress® Method. http://www.vishaypg.com/micro-measurements, 2005.

2. micro-measurements, introduction to Photoelasticity. http://www.vishaypg.com, 2018.

3. Photoelasticity;Phillips;TAM326-Experimental Stress Analysis.,1998

4. Vishay precision group - micro - measurements - PhotoStress Coating Materials and Adhesives, (2018).

5. Nucleation, bifurcation and propagation of local deformation arising in NiTi shape memory alloy;Murasawa;J. Smart Mater. Struct.,2007
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