Enhancement mechanism of Y-doped Ce1−xYxO2 for photocatalytic-assisted chemical-mechanical polishing

Author:

Xu Ning,Luo Yuxin,Ma Jiahui,Lin Yu,Zhu Xinrui,Pu Yongping

Publisher

Elsevier BV

Subject

Materials Chemistry,Mechanics of Materials,General Materials Science

Reference63 articles.

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2. The research status and development trends of chemical mechanical polishing;Yan;Mater. Res. Appl.,2021

3. Cerium-based metal–organic framework nanorods nucleated on CeO2 nanosheets for photocatalytic N2 fixation and water oxidation;Mansingh;ACS Appl. Nano Mater.,2021

4. Enhancing the Polishing Efficiency of CeO2 Abrasives on the SiO2 Substrates by Improving the Ce3+ Concentration on Their Surface;Ma;ACS Appl. Electron. Mater.,2022

5. Controllable synthesis and polishing properties of ceria behavior of ceria nanoparticles;Xu;Shandpng Chem. Ind.,2020

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