HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition-Reference-Cited by-同舟云学术

HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition

Published:2021-04 Issue: Volume:859 Page:157875
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Yin Chaoyi^ORCID,Zhu Meiping,Zeng Tingting,Song Chen,Chai Yingjie,Shao Yuchuan,Zhang Rongjun,Zhao Jiaoling,Li Dawei,Shao Jianda

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

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