Tailored inclusion of semiconductor nanoparticles in nanoporous polystyrene-block-polymethyl methacrylate thin films-Reference-Cited by-同舟云学术

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Tailored inclusion of semiconductor nanoparticles in nanoporous polystyrene-block-polymethyl methacrylate thin films

Published:2020-12 Issue: Volume:210 Page:122983
ISSN:0032-3861
Container-title:Polymer
language:en
Short-container-title:Polymer

Author:

Malafronte Anna,Emendato Alessandro,Auriemma Finizia,Sasso Carmen,Laus Michele,Murataj Irdi,Lupi Federico Ferrarese,De Rosa Claudio

Funder

Compagnia di San Paolo

Università degli Studi di Napoli Federico II

Publisher

Elsevier BV

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference65 articles.

1. Block copolymer thermodynamics: theory and experiment;Bates;Annu. Rev. Phys. Chem.,1990

2. The Physics of Block Copolymers;Hamley,1998

3. Block copolymer lithography;Bates;Macromolecules,2014

4. Block copolymer nanolithography: translation of molecular level control to nanoscale patterns;Bang;Adv. Mater.,2009

5. Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large;Koo;Soft Matter,2013

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Liquid Phase Infiltration of Block Copolymers;Polymers;2022-10-14

2. Nanostructured dimethacrylate-based photopolymerizable systems by modification with diblock copolymers;Polymer;2021-12

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