The role of ammonium citrate and dodecyl pyridinium chloride on chemical mechanical polishing relevant to SiO2 dielectric layer-Reference-Cited by-同舟云学术

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The role of ammonium citrate and dodecyl pyridinium chloride on chemical mechanical polishing relevant to SiO2 dielectric layer

Published:2023-12 Issue: Volume:107 Page:333-344
ISSN:1526-6125
Container-title:Journal of Manufacturing Processes
language:en
Short-container-title:Journal of Manufacturing Processes

Author:

Zhang Xianglong,Meng Ni,Li Xianghui,Mei Xukun,Yang Luyao,He Yangang

Funder

Natural Science Foundation of Hebei Province

National Major Science and Technology Projects of China

Publisher

Elsevier BV

Reference44 articles.

1. Interfacial reactivity between ceria and silicon dioxide and silicon nitride surfaces: organic additive effects;Carter;Electrochem Solid State Lett,2005

2. Study on adhesion removal model in CMP SiO2 ILD;Guo;Key Eng Mater,2009

3. Advances in chemical-mechanical planarization;Singh;MRS Bull,2002

4. Comparison between SiOC thin films fabricated by using plasma enhance chemical vapor deposition and SiO2 thin films by using fourier transform infrared spectroscopy;Oh;J Korean Phys Soc,2010

5. 3 - chemical vapor deposition of silicon dioxide films;Foggiato,2001

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