Directed self-oriented self-assembly of block copolymers using topographical surfaces-Reference-Cited by-同舟云学术

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Directed self-oriented self-assembly of block copolymers using topographical surfaces

Published:2015 Issue: Volume: Page:99-127
ISSN:
Container-title:Directed Self-assembly of Block Co-polymers for Nano-manufacturing
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Author:

Choi J.,Carter K.R.,Russell T.P.

Publisher

Elsevier

Reference155 articles.

1. Gaussian-to stretched-coil transition in block copolymer melts;Almdal;Phys. Rev. Lett.,1990

2. Neutron reflectivity studies of the surface-induced ordering of diblock copolymer films;Anastasiadis;Phys. Rev. Lett.,1989

3. Extreme ultraviolet interference lithography at the Paul Scherrer Institut;Auzelyte;J. Micro/Nanolith. MEMS MOEMS,2009

4. Facile routes to patterned surface neutralization layers for block copolymer lithography;Bang;Adv. Mater.,2007

5. Polymer-polymer phase behavior;Bates;Science,1991

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1. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae;ACS Nano;2017-07-20

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