Author:
Specht M.,Reisinger H.,Hofmann F.,Schulz T.,Landgraf E.,Luyken R.J.,Rösner W.,Grieb M.,Risch L.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Nonvolatile semiconductor memory technology,1998
2. Fujiwara I, Aozasa H, Nakamura A, Komatsu Y, Hayashi Y. International Electron Device Meeting 1998, Digest of Technical Papers. p. 995–8
3. Reisinger H, Franosch M, Hasler B, Bohm T. 1997 Symposium on VLSI Technology, Digest of Technical Papers. p. 113–4
4. Determination of interface energy band diagram between (100)Si and mixed Al–Hf oxides using internal electron photoemission
5. High-κ gate dielectrics: Current status and materials properties considerations
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