Author:
Hu Terry,Steihl Lynn,Rafaniello William,Fawcett Timothy,Hawn David D.,Mashall Joan G.,Rozeveld Steve J.,Putzig Curt L.,Blackson John H.,Cermignani William,Robinson M.Gene
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference29 articles.
1. Chemical vapor deposition of mixed phase α-AlB12-B
2. Morphology of chemical vapor deposited titanium diboride
3. Analysis of the Chemical Vapor Deposition of Titanium Diboride: I . Equilibrium Thermodynamic Analysis
4. Analytical investigations in the BC system
5. H. Werheit, In: O. Mandelung, M. Schulz, H. Weiss (Eds.), Boron Compounds, Landoldt–Bornstein, Numerical Data and Functional Relationships in Science and Technology, New Series, Group III Semiconductors, Vol. 17g, Springer, Berlin, 1984, p.9.
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