Highly sensitive and selective detection of dopamine using atomic layer deposited HfO2 ultra-thin films-Reference-Cited by-同舟云学术

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Highly sensitive and selective detection of dopamine using atomic layer deposited HfO2 ultra-thin films

Published:2024-09 Issue: Volume:497 Page:144574
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Abraham Daniel Arulraj,Li Ai-Dong,Sanmugam Anandhavelu,Wadaan Mohammad Ahmad,Baabbad Almohannad,Kanagaraj Kuppusamy^ORCID,Karuppasamy K.,Maiyalagan T.^ORCID,Kim Hyun-Seok,Vikraman Dhanasekaran^ORCID

Publisher

Elsevier BV

Reference61 articles.

1. Low-temperature atomic layer deposition of hafnium oxide for gating applications;Shekhar;ACS Appl. Mater. Interfaces,2022

2. Reduced leakage current in atomic-layer-deposited HfO2 thin films deposited at low temperature by in-situ defect passivation;Kim;Appl. Surf. Sci.,2024

3. Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O3 reactants;Ko;Dalton Trans.,2021

4. Atomic layer deposition of HfO2 films using TDMAH and water or ammonia water;Gieraltowska;Materials,2023

5. Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition;Kim;J. Mater. Chem. C,2016

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