Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing-Reference-Cited by-同舟云学术

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Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing

Published:2024-02 Issue: Volume:36 Page:102033
ISSN:2352-9407
Container-title:Applied Materials Today
language:en
Short-container-title:Applied Materials Today

Author:

Frechilla Alejandro,Napari Mari,Strkalj Nives,Barriuso Eduardo,Niang Kham,Hellenbrand Markus,Strichovanec Pavel,Simanjuntak Firman Mangasa,Antorrena Guillermo,Flewitt Andrew,Magén César,de la Fuente Germán F.,MacManus-Driscoll Judith L.,Angurel Luis Alberto,Pardo José Ángel

Publisher

Elsevier BV

Subject

General Materials Science

Reference55 articles.

1. Ferroelectricity in hafnium oxide thin films;Böscke;Appl. Phys. Lett.,2011

2. Ferroelectric Hf0.5Zr0.5O2 thin films: a review of recent advances;Kim;JOM,2019

3. The fundamentals and applications of ferroelectric HfO2;Schroeder;Nat. Rev. Mater.,2022

4. The system zirconia-hafnia;Ruh;J. Am. Ceram. Soc.,1968

5. On the structural origins of ferroelectricity in HfO2 thin films;Sang;Appl. Phys. Lett.,2015

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. On the Thickness Scaling of Ferroelectric Hafnia;IEEE Transactions on Materials for Electron Devices;2024

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