Preparation of CeO2 abrasives by reducing atmosphere-assisted molten salt method for enhancing their chemical mechanical polishing performance on SiO2 substrates-Reference-Cited by-同舟云学术

Preparation of CeO2 abrasives by reducing atmosphere-assisted molten salt method for enhancing their chemical mechanical polishing performance on SiO2 substrates

Published:2022-10 Issue: Volume: Page:
ISSN:1002-0721
Container-title:Journal of Rare Earths
language:en
Short-container-title:Journal of Rare Earths

Author:

Xu Ning^ORCID,Ma Jiahui,Liu Qi,Luo Yuxin,Pu Yongping

Publisher

Elsevier BV

Subject

Geochemistry and Petrology,General Chemistry

Reference41 articles.

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3. Development of polystyrene/polyaniline/ceria (PS/PANI/CeO2) multi-component abrasives for photochemical mechanical polishing/planarization applications;Chen;Appl Surf Sci,2022

4. Chemical mechanical planarization: slurry chemistry, materials, and mechanisms;Krishnan;Chem Rev,2010

5. Threshold contact pressure for the material removal on monocrystalline silicon by SiO2 microsphere;Xiao;Wear,2017

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