Contributions to computer-aided interpretation of ion sputtering depth profiling
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference23 articles.
1. Secondary ion emission for surface and in-depth analysis of tantalum thin films
2. Sputtering of amorphous silicon films by 0.5 to 5 keV Ar+ ions
3. Auger electron spectroscopy depth profiling of Ni/Cr multilayers by sputtering with N2+ ions
4. Opticalin situ sputter rate measurements during ion sputtering
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