Experimental and simulated etched track profiles for two relativistic ions treated under different etching conditions: How to shape different track envelopes
-
Published:2023-12
Issue:
Volume:213
Page:111238
-
ISSN:0969-806X
-
Container-title:Radiation Physics and Chemistry
-
language:en
-
Short-container-title:Radiation Physics and Chemistry
Author:
Awad E.M.ORCID,
Bebers E.,
Abu-Shady M.,
Habib A.,
Hassan S.,
Fromm M.