登录 注册 会员服务 联系我们

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

  • Published:2011-02 Issue:2 Volume:80 Page:236-241
  • ISSN:0969-806X
  • Container-title:Radiation Physics and Chemistry
  • language:en
  • Short-container-title:Radiation Physics and Chemistry

Author:

Lawrie Kirsten,Blakey Idriss,Blinco James,Gronheid Roel,Jack Kevin,Pollentier Ivan,Leeson Michael J.,Younkin Todd R.,Whittaker Andrew K.

Publisher

Elsevier BV

Subject

Radiation

Reference34 articles.

1. A new family of non-chemically amplified resists;Aviram;Proc. SPIE,1998

2. Radiation degradation of poly(olefin sulfone)s—fundamental research to practical applications;Bowden;Dev. Polym. Degrad.,1985

3. Vapor development of poly(olefin sulfone) resists;Bowden;Polym. Eng. Sci.,1974

4. Post-irradiation thermal degradation of poly(olefin sulfones);Bowmer;Polymer,1981

5. Shot noise, LER, and quantum efficiency of EUV photoresists;Brainard;Proc. SPIE,2004
同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3