Modelling of fin width dependent threshold voltage in fin shaped nano channel AlGaN/GaN HEMT
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science
Reference19 articles.
1. AlGaN/GaN HEMTs - An overview of device operation and applications;Mishra;Proc. IEEE,2002
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3. Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in undoped and doped AlGaN/GaN heterostructures;Ambacher;J. Appl. Phys.,2000
4. Control of threshold voltage of AlGaN/GaN HEMTs by fluoride-based plasma treatment: From depletion mode to enhancement mode;Cai;IEEE Electron. Device Lett.,2006
5. Recessed-gate enhancement-mode GaN HEMT with high threshold voltage;Lanfor;IEEE Electron. Device Lett.,2005
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2. Barrier and channel thickness engineering to optimize fin height for enhancement mode Al0.3Ga0.7N/GaN FinHEMT;International Journal of Numerical Modelling: Electronic Networks, Devices and Fields;2023-12-14
3. RF/Analog and Linearity Performance Evaluation of Lattice-matched Ultra-thin AlGaN/GaN Gate Recessed MOSHEMT with Silicon Substrate;Silicon;2022-01-13
4. E-mode All-GaN-Integrated cascode MISHEMT with GaN/InAlGaN/GaN backbarrier for high power switching performance: Simulation study;Superlattices and Microstructures;2021-12
5. Tri-Gate GaN Junction HEMTs: Physics and Performance Space;IEEE Transactions on Electron Devices;2021-10
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