Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering
Author:
Publisher
Elsevier BV
Subject
Applied Mathematics
Reference17 articles.
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1. Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels;Surface and Coatings Technology;2021-09
2. Preparation and characterization of nanostructured TiCrN thin films deposited from Ti-Cr mosaic target by reactive DC magnetron sputtering;Journal of Physics: Conference Series;2021-01-01
3. The Effect of Annealing Temperature on Structure of TiCrN Thin Film Deposited by DC Magnetron Sputtering Method;Applied Mechanics and Materials;2020-08
4. Effect of Substrate-Target Distance on the Structure of TiCrN Films Deposited from Mosaic Target by Reactive DC Magnetron Sputtering;Key Engineering Materials;2019-04
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