Application of the Fenton reaction in silicon carbide polishing and its oxidative active center-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Application of the Fenton reaction in silicon carbide polishing and its oxidative active center

Published:2024-09 Issue:18 Volume:50 Page:34357-34370
ISSN:0272-8842
Container-title:Ceramics International
language:en
Short-container-title:Ceramics International

Author:

Hao Xiaodong,Chen Jiapeng,Wu Xiongjie^ORCID,Lin Jie,He Anjie,Jiang Zhenlin,Wang Wenjun,Wang Baoxiu,Sun Tao^ORCID

Funder

National Natural Science Foundation of China

Jiangsu Key Laboratory of Precision and Micro-Manufacturing Technology

Publisher

Elsevier BV

Reference34 articles.

1. A novel slurry for chemical mechanical polishing of single crystal diamond;Liao;Appl. Surf. Sci.,2021

2. Doping strategy on properties and chemical mechanical polishing performance of CeO2 Abrasives: a DFT assisted experimental study;Ma;Appl. Surf. Sci.,2023

3. Environment-friendly electrochemical mechanical polishing using solid polymer electrolyte/CeO2 composite pad for highly efficient finishing of 4H-SiC (0001) surface;Murata;Appl. Surf. Sci.,2023

4. Revealing the mechanisms for inactive rolling and wear behaviour on chemical mechanical planarization;Nguyen;Appl. Surf. Sci.,2022

5. High efficient polishing of sliced 4H-SiC (0001) by molten KOH etching;Zhang;Appl. Surf. Sci.,2020

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP