Heat conduction characteristic of 3D nano-silicon thin films induced by ultrafast laser-Reference-Cited by-同舟云学术

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Heat conduction characteristic of 3D nano-silicon thin films induced by ultrafast laser

Published:2024-07 Issue: Volume:201 Page:108996
ISSN:1290-0729
Container-title:International Journal of Thermal Sciences
language:en
Short-container-title:International Journal of Thermal Sciences

Author:

Mao Yudong^ORCID,Liu Shouyu,Yu Mingzhi^ORCID,Chen Binjian,Liu Jiying,Yang Kaimin

Publisher

Elsevier BV

Reference46 articles.

1. Three-dimensional nanofabrication via ultrafast laser patterning and kinetically regulated material assembly;Han;Science,2023

2. Fabrication of nanocrystalline silicon thin films utilized for optoelectronic devices prepared by thermal vacuum evaporation;Ghazala;ACS Omega,2020

3. A three-dimensional porous Si/SiOx decorated by nitrogen-doped carbon as anode materials for lithium-ion batteries;Song;Colloids Surf. A Physicochem. Eng. Asp.,2023

4. Stable three-dimensional porous silicon-carbon-gold composite film for enrichment and directly electrochemical detection of bisphenol A;Chen;Microchem. J.,2021

5. Ultrafast thermalization dynamics in Au/Ni film excited by femtosecond laser double-pulse vortex beam;Du;Int. J. Therm. Sci.,2023

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