Increase of Si solution rate into Al matrix by repeated irradiation of intense pulsed ion beam-Reference-Cited by-同舟云学术

Increase of Si solution rate into Al matrix by repeated irradiation of intense pulsed ion beam

Published:2002-05 Issue:3-4 Volume:65 Page:563-569
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Akamatsu H.,Tanaka H.,Yamanishi T.,Egawa S.,Yamasaki T.,Miki M.,Yatsuzuka M.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference15 articles.

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5. Amorphous layer formation on a Ni65Cr15P16B4 alloy by irradiation of an intense pulsed ion beam

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