Dynamical process monitoring using dynamical hierarchical kernel partial least squares-Reference-Cited by-同舟云学术

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Dynamical process monitoring using dynamical hierarchical kernel partial least squares

Published:2012-08 Issue: Volume:118 Page:150-158
ISSN:0169-7439
Container-title:Chemometrics and Intelligent Laboratory Systems
language:en
Short-container-title:Chemometrics and Intelligent Laboratory Systems

Author:

Zhang Yingwei,Li Shuai,Hu Zhiyong,Song Chonghui

Funder

China's National 973 program

NSF

Publisher

Elsevier BV

Subject

Spectroscopy,Process Chemistry and Technology,Computer Science Applications,Software,Analytical Chemistry

Reference38 articles.

1. Fault detection of plasma etchers using optical emission spectra;Yue;IEEE Transactions on Semiconductor Manufacturing,2000

2. Online monitoring of multi-phase batch processes using phase-based multivariate statistical process control;Doan;Computers and Chemical Engineering,2008

3. Fault detection and diagnosis in an industrial fed-batch cell culture process;Gunther;Biotechnology Progress,2007

4. A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process;Wise;Journal of Chemometrics,1999

5. On unifying multi-block analysis with application to decentralized process monitoring;Qin;Journal of Chemometrics,2001

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