IR laser-induced co-decomposition of dimethyl selenide and trisilane: Gas-phase formation of SiSe and chemical vapor deposition of nanostructured H/Si/Se/C polymers-Reference-Cited by-同舟云学术

IR laser-induced co-decomposition of dimethyl selenide and trisilane: Gas-phase formation of SiSe and chemical vapor deposition of nanostructured H/Si/Se/C polymers

Published:2007-05 Issue:2-3 Volume:188 Page:399-408
ISSN:1010-6030
Container-title:Journal of Photochemistry and Photobiology A: Chemistry
language:en
Short-container-title:Journal of Photochemistry and Photobiology A: Chemistry

Author:

Santos Magna,Díaz Luis,Urbanová Markéta,Bastl Zdeněk,Šubrt Jan,Pola Josef

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Chemical Engineering,General Chemistry

Reference85 articles.

1. A laser augmented reaction: SF6+ SiH4→S*2+ SiF4+ HF + H2· retention of isotopic selectivity during detonation

2. Single pulse laser induced reactions of hexafluorobenzene/silane mixtures at 1027 and 944 cm-1

3. The infrared laser photochemistry of silane

4. Formation of silylgermane by a silylene insertion reaction in the infrared photochemistry of monosilane-monogermane mixtures

5. IR Laser-induced chemistry of some perhaloethene–silane mixtures at different single irradiating wavelengths

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